Source-linked AI summary
MaskPlace: Fast Chip Placement via Reinforced Visual Representation Learning
Yao Lai, Yao Mu, Ping Luo
TL;DR
Chip placement must optimize metrics such as wirelength while satisfying hard density and congestion constraints, and existing approaches have limitations in representing pin information or producing valid layouts. MaskPlace applies pixel-level visual representations in reinforcement learning to place modules. Across 24 public benchmarks, it reports zero-overlap layouts and wirelength reductions of up to 5× versus Graph Placement and 9× versus DeepPR.
Problem
Chip placement must optimize metrics including wirelength while meeting hard density and congestion constraints, and prior methods face limitations in representation or valid placement.
Source: §1 · pp. 1–2Method
MaskPlace uses pixel-level visual representations of placement information in a reinforcement-learning policy for placing circuit modules.
Source: §1 · p. 3, §3 · pp. 4–5Results
Across 24 public benchmarks, MaskPlace always produces layouts with 0% overlap and reduces wirelength up to 5× versus Graph Placement and 9× versus DeepPR.
Source: §1 · p. 3Takeaways & Limitations
MaskPlace reports a method for producing valid, non-overlapping placements without reducing the search space.
Source: §5 · p. 9For placing millions of standard cells, MaskPlace still requires an optimization method because RL’s state space is too large.
Source: §5 · p. 9
Abstract
from arXiv · showhide
Placement is an essential task in modern chip design, aiming at placing millions of circuit modules on a 2D chip canvas. Unlike the human-centric solution, which requires months of intense effort by hardware engineers to produce a layout to minimize delay and energy consumption, deep reinforcement learning has become an emerging autonomous tool. However, the learning-centric method is still in its early stage, impeded by a massive design space of size ten to the order of a few thousand. This work presents MaskPlace to automatically generate a valid chip layout design within a few hours, whose performance can be superior or comparable to recent advanced approaches. It has several appealing benefits that prior arts do not have. Firstly, MaskPlace recasts placement as a problem of learning pixel-level visual representation to comprehensively describe millions of modules on a chip, enabling placement in a high-resolution canvas and a large action space. It outperforms recent methods that represent a chip as a hypergraph. Secondly, it enables training the policy network by an intuitive reward function with dense reward, rather than a complicated reward function with sparse reward from previous methods. Thirdly, extensive experiments on many public benchmarks show that MaskPlace outperforms existing RL approaches in all key performance metrics, including wirelength, congestion, and density. For example, it achieves 60%-90% wirelength reduction and guarantees zero overlaps. We believe MaskPlace can improve AI-assisted chip layout design. The deliverables are released at https://laiyao1.github.io/maskplace.
1 Introduction
Chip placement must optimize several metrics while satisfying hard constraints, but both classic optimization and learning-based approaches face limitations. MaskPlace uses pixel-level visual representations and reports strong results across 24 public benchmarks.
1 Introduction
- Placement must minimize metrics including power, timing, area, and wirelength while meeting hard density and routing-congestion constraints.Wirelength is linked to delay and power, but reducing it by overlapping modules violates the density constraint.Source: §1 · p. 1
- Classic optimization methods relax hard constraints, so DREAMPlace may produce overlaps and require legalization that can increase wirelength or fail to find a feasible solution.The cited text identifies manual refinement and legalization as post-processing steps for removing overlaps.Source: §1 · p. 2
- Prior RL methods represent netlists as hypergraphs, but omit pin offsets or require heavy computation to encode them, while reduced placement scope or resolution sacrifices performance.Graph Placement places 15% of modules with RL; DeepPR reduces module and canvas resolution.Source: §1 · p. 2
- MaskPlace learns pixel-level visual representations of circuit modules and uses a policy network to aggregate global and subtle canvas information for efficient placement.The approach targets macro placement and can generate valid layouts within a few hours, unlike prior methods requiring manual refinement.Source: §1 · p. 3
- Across 24 public benchmarks, MaskPlace always produces layouts with 0% overlap and reduces wirelength up to 5× versus Graph Placement and 9× versus DeepPR.Figure 1 also shows MaskPlace with the lowest HPWL, wirelength, and overlap area ratio among the four illustrated approaches on bigblue3.Source: Figure 1 · p. 2, §1 · p. 3
2 Preliminary and Notation
This section defines placement quality and the constraints for valid layouts. It also explains how congestion and overlap are handled in the proposed approach.
2 Preliminary and Notation
- HPWL estimates wirelength by summing the half-perimeters of each net’s bounding box, with each half-perimeter equal to the box’s height plus width.For the illustrated example, the total is h1 + w1 + h2 + w2.Source: §2 · p. 3
- A valid layout requires congestion below a desired threshold and zero overlap between modules.Congestion is estimated with the RUDY estimator; overlap measures overlapping regions between pairs of modules.Source: §2 · pp. 3–4
- Figure 2 contrasts pixel-level placement masks with a hypergraph representation that loses pin-location information.Its position mask marks feasible locations and placed modules, while lighter wire-mask values indicate shorter wirelength.Source: Figure 2 · p. 4
- MaskPlace avoids explicitly calculating the O(V^2) density metric during training by ensuring non-overlapping placement.The text identifies pairwise overlap-density calculation as time-consuming.Source: §2 · p. 4
3 Our Approach
MaskPlace represents placement states with pixel-level masks and uses policy and value networks to select and evaluate placements. It trains with reinforcement learning and applies congestion checks when choosing final actions.
Model Architecture Overview
- The policy network turns pixel-level features into placement probabilities, while the value network evaluates the state using global features and the current module’s positional embedding.The policy uses a convolutional encoder-decoder, and the value network uses an embedding model.Source: §3 · pp. 4–6
Position Mask
- The position mask marks feasible canvas locations for the current module, supporting non-overlapping placement and learning the relationship between placement and wirelength.The mask is a binary matrix on a 224 × 224 canvas grid.Source: §3 · p. 4
Wire Mask
- The wire mask encodes each candidate position’s increase in HPWL, including pin offsets, so the policy can seek placements with smaller wirelength increases.The described fast calculation reduces complexity from O(N^2P) to O(NP).Source: §3 · p. 5
View Mask
- The view mask records occupied cells using actual module sizes, rather than assuming every module has unit size.A module of size w × h covers ⌈wN/W⌉ × ⌈hN/H⌉ canvas cells.Source: §3 · p. 5
Reinforcement Learning
- The policy and value networks are trained with actor-critic PPO2, using HPWL as a dense reward based on its change after each placement.The step reward is HPWL_t−1 − HPWL_t, and bounding-box ranges can be maintained with O(P) cost.Source: §3 · p. 6
Training and Testing
- At test time, a congestion satisfaction block checks sampled actions against a threshold and selects a final action that meets the constraint when possible.If sampled actions cannot meet the threshold, it selects the action with minimal congestion.Source: §3 · p. 6
4 Experiments
Across public benchmarks, MaskPlace achieves strong wirelength results while maintaining non-overlapping placements; additional evaluations examine routing wirelength, standard cells, runtime, transferability, ablations, and congestion constraints.
Main Results
- MaskPlace achieves the lowest wirelength in six of seven benchmarks, while conventional optimization methods may fail on high-area-usage circuits such as ariane.The comparison uses five random seeds for learning-based methods and reports means and variances.Source: §4 · pp. 6–7, Table 2 · p. 7
Compare to Graph Representation
- Compared with Graph Placement, MaskPlace reduces HPWL by up to 80% in the ISPD benchmark while ensuring zero overlaps across all benchmarks.Soft constraints may improve HPWL and congestion, but can produce nonzero overlap area.Source: §4 · p. 7, Table 3 · p. 7, Table 4 · p. 8
Routing Wirelength
- MaskPlace achieves 60% to 90% shorter routing wirelength than DeepPR.The comparison attributes the result to using HPWL rather than true wirelength as the reward; true-wirelength reward lowers efficiency and produces sparse rewards.Source: §4 · p. 7, Table 5 · p. 8
Standard Cells
- On bigblue3, which has more than a million standard cells, MaskPlace surpasses the other approaches by up to 50%.The comparison reports HPWL for macros and standard cells.Source: §4 · pp. 7–8, Table 6 · p. 8
Additional Evaluations
- The experiments also evaluate MaskPlace without real module sizes and test transfer from a model trained on adaptec1, but the supplied passages report no quantitative outcomes for these tests.The text says the no-real-size setting has significant advantages and describes transferability as good, without giving the values.Source: §4 · p. 8, Table 7 · p. 8, Table 8 · p. 8
Efficiency
- MaskPlace is faster than the two other learning-based approaches in inference under the reported evaluation setup.All methods were evaluated on one GeForce RTX 3090 GPU; DREAMPlace's CPU version used 16 threads on a 16-core environment.Source: §4 · p. 8, Table 9 · p. 9
Ablation Study
- The standard MaskPlace configuration with curriculum learning performs best among the tested component variants on adaptec1.The ablation uses five seeds; tested variants include sparse reward, input masks, placement-order features, and local feature fusion kernels.Source: §4 · pp. 8–9, Figure 6 · p. 9
Congestion Satisfaction
- MaskPlace satisfies the congestion constraint across five seeds in a suitable range, but lowering the threshold increases HPWL and thresholds below about 40 are hard to satisfy on adaptec3.The authors attribute the lower-threshold difficulty to nets needing a minimum amount of wire resources.Source: §4 · p. 9
5 Conclusion
The paper presents MaskPlace as an RL placement method using visual representations and practical rewards, and reports satisfactory results on key metrics while acknowledging a standard-cell placement boundary.
Conclusion
- MaskPlace uses rich visual representations that learn position, wirelength, and view information to guide placement actions without reducing the search space.The paper says its direct reward function is based on practical scenarios and reports satisfactory results on key metrics while avoiding undesired overlaps.Source: §5 · p. 9, Figure 7 · p. 9
- The method's demonstrated scope is one stage of chip design flow; placing millions of standard cells still requires an optimization method because RL's state space is too large.The authors identify suitable representations for RL-based standard-cell placement as future work.Source: §5 · p. 9
Checklist
The checklist records affirmative responses for discussing the work's claims and limitations, reporting experimental details, and releasing assets; human-subject and personal-information items are marked not applicable.
Checklist
- The checklist marks the main claims and limitations as discussed and the potential societal impacts as addressed.It also records conformity with ethics review guidelines.Source: Checklist · p. 12
- For experiments, the checklist marks reproduction materials, training details, error bars, and compute-resource reporting as included.Source: Checklist · p. 12
- The checklist marks citation of existing assets and release of new assets as complete, while personal-information and human-subject items are marked not applicable.Source: Checklist · p. 12
A.1 Module, Net and Pin
The appendix distinguishes macros from standard cells and defines how pins and nets connect modules. MaskPlace is currently applied to macro placement, which is performed before standard-cell placement to reserve space for macros.
A.1 Module, Net and Pin
- MaskPlace is currently used for macro placement because standard cells are numerous, while placement methods usually place macros first to reserve enough space for them.Macros include DRAMs, caches, and IO interfaces; standard cells are mainly much smaller logical gates.Source: §A.1 · p. 13
- Pins are module input/output interfaces connected directly by wires, with fixed relative positions on their modules.Source: §A.1 · p. 13
- A net groups pins connected by the same wires; pins from a net form a bounding box, and usually each pin belongs to one net with more than two pins.Source: §A.1 · p. 13
A.2 Metric
The appendix describes HPWL, congestion, and density as placement metrics, then outlines algorithms for dense reward generation, mask construction, and congestion-threshold satisfaction.
A.2 Metric
- HPWL estimates wirelength as the sum of half-perimeters of net bounding boxes; it is an optimization objective, while congestion and density are constraints.HPWL is smaller-is-better, and congestion and density must remain below given thresholds.Source: §A.2 · pp. 13–14
- RUDY estimates congestion by accumulating 1/h + 1/w for net bounding boxes covering each grid cell, then using the maximum cell value or the average of the top k values.The method uses RUDY because rough-routing-based congestion estimation is computationally intensive.Source: §A.2 · pp. 13–14
- Density is the maximum stackable coverage-area ratio over grid cells; a low density alone does not guarantee that placements have no overlaps.The method considers density in evaluation because its placement method ensures no overlaps.Source: §A.2 · p. 14
A.3 Algorithms
- The algorithms generate dense incremental HPWL rewards and efficiently construct position and wire masks for each module.Position masks use the widths, heights, and positions of previously placed modules; wire masks accumulate wirelength increases using net coordinates and pin offsets.Source: §A.3 · pp. 14–15
end
- The congestion-satisfaction procedure samples actions, evaluates congestion and wirelength, and selects an action meeting the threshold when possible.If no sampled action satisfies the threshold, it chooses the one with minimum congestion increase.Source: end · p. 16
A.4 Details of Model Architecture
The appendix directs readers to tables for the model architecture and for the features used in state representation and placement ordering.
A.4 Details of Model Architecture
- Table 10 contains the model architecture parameters, while Table 11 lists features used for pixel-level mask generation.Source: §A.4 · p. 17, Table 10 · p. 17, Table 11 · p. 17
- Table 12 presents a comparison of the features used for placement order across methods.Source: §A.4 · p. 17, Table 12 · p. 17
A.5 Training Configuration
The appendix points to a table of model configuration and hyperparameter settings and notes that three baseline methods use their open-source implementations with default settings.
A.5 Training Configuration
- Table 13 contains the model configuration and hyperparameter settings.Source: §A.5 · p. 17, Table 13 · p. 18
- DREAMPlace, Graph Placement, and DeepPR are implemented using their open-source code with default settings.Source: §A.5 · p. 18
A.6 Details of Benchmark
The benchmark statistics are summarized in Table 14. The benchmark set distinguishes hard macros from soft macros for Graph Placement, but MaskPlace places all macros itself and can also handle circuits with ports.
- Graph Placement places hard macros with RL and soft macros with a classic optimization method; MaskPlace places all macros with RL.Source: §A.6 · p. 18
- Ports are fixed, zero-size terminals connecting a circuit to external circuitry, and MaskPlace supports circuits with ports without modification.Source: §A.6 · p. 18
- Table 14 summarizes statistics for the different chip benchmarks.Source: Table 14 · p. 18
A.7 Supplementary Experiment
Supplementary experiments report MaskPlace’s placement performance on IBM benchmarks, bigblue4, and a search-time comparison. The appendix also describes how state-derived masks and local and global features feed the model, while related work contrasts classic and learning-based placement approaches.
A.7 Supplementary Experiment
- MaskPlace achieves the lowest HPWL across the evaluated IBM benchmarks, where DREAMPlace places standard cells and MaskPlace places large macros.Table 15 identifies the comparison as HPWL for macro and standard-cell placement in the IBM benchmark.Source: §A.7 · pp. 18–19, Table 15 · p. 19
- MaskPlace achieves the best reported performance on the larger ISPD 2005 benchmark circuit bigblue4.Table 16 reports HPWL results for bigblue4; the supplied text does not state the individual values.Source: §A.7 · p. 19, Table 16 · p. 19
- In an adaptec1 comparison using HPWL, MaskPlace achieves the best performance in a few hours against Graph Placement and DeepPR.The methods were tested in the same environment; Figure 10 presents the search-time comparison.Source: §A.7 · p. 19, Figure 10 · p. 19
A.8 Detailed equation description of the model
- Given current state st, the method calculates position, wire, and view masks through m(·), then extracts a local feature and uses global mask encoder encη(·).The passage identifies gω(·) as a 1×1 convolutional neural network.Source: §A.8 · p. 20
- The model decodes global features to the action-space dimension, combines them with local features and a position mask, and uses the result to derive policy outputs.A transpose-convolutional network decodes global features; a 1×1 convolution merges features before the policy network.Source: §A.8 · p. 20
B Related Work
- Partitioning-based methods divide circuits to reduce inter-part connections, but isolated within-part optimization and difficult partitioning can limit them; simulated annealing is inefficient and sensitive to its random initial state.Source: B Related Work · p. 20
- Analytical methods offer strong classic placement quality, but quadratic methods use rough approximations and nonlinear methods can retain approximations and overlaps.Nonlinear methods can handle large-scale modules, but combining multiple metrics in one objective does not avoid overlaps.Source: B Related Work · p. 20
- Learning-assisted classic tools still depend heavily on those tools, while pure RL methods use graph representations that lose pin information and may allow overlaps; routing-wirelength rewards can also be sparse.DeepPR also ignores realistic module sizes; HPWL is described as a high-quality wirelength estimate with an inherent dense reward.Source: B Related Work · p. 21